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Chenming Calvin Hu (Chinese: 胡正明; pinyin: Hú Zhèngmíng; born 1947) is a Taiwanese electronic engineer who specializes in microelectronics. He is TSMC Distinguished Professor Emeritus in the electronic engineering and computer science department of the University of California, Berkeley, in the United States. In 2009, the Institute of Electrical and Electronics Engineers described him as a “microelectronics visionary … whose seminal work on metal-oxide semiconductor MOS reliability and device modeling has had enormous impact on the continued scaling of electronic devices”.[1]

Chenming Hu
Native name
Born1947 (age 71–72)
Beijing, Republic of China
ResidenceUnited States
Other namesChenming Calvin Hu
Alma mater
Scientific career
FieldsElectrical engineering
InstitutionsUniversity of California, Berkeley

Education and careerEdit

Hu completed his bachelor's degree at the National Taiwan University in Taipei in 1968, and completed master's and doctoral degrees at the University of California, Berkeley in 1970 and 1973, respectively.[1]

He is a professor of electrical engineering and computer science at the University of California, Berkeley since 1976 (currently as a Professor Emeritus).[2]

He has made significant contributions in microelectronics research. He was one of the developers of the FinFET, a multi-gated MOSFET device, and was among the creators of the Berkeley Short‐Channel IGFET Model family of MOSFETs.[1] Since the 1980s, Hu has written extensively on the reliability of the silicon oxide layer in semi-conductors.[3]

Between 2001 and 2004 Hu was the chief technology officer of Taiwan Semiconductor Manufacturing Company. He has sat on the board of several companies, including Inphi Corporation, FormFactor, MoSys and SanDisk; he was chairman of the board of Celestry Design Solutions, which he founded.[2]

Awards and honorsEdit


  1. ^ a b c d "Chenming Calvin Hu, Microelectronics Visionary, to Receive 2009 IEEE Jun‐Ichi Nishizawa Medal" (PDF). IEEE. Retrieved 2019-01-15.
  2. ^ a b Chenming Hu. Archived August 10, 2008.
  3. ^ David J. Dumin (2002). Oxide Reliability: A Summary of Silicon Oxide Wearout, Breakdown, and Reliability. River Edge, New Jersey: World Scientific. p. 7. ISBN 9789810248420.
  4. ^ "NAE Members Directory - Dr. Chenming Hu". NAE. Retrieved 2019-01-15.
  5. ^ "IEEE Jack A. Morton Award Recipients" (PDF). IEEE. Retrieved 2019-01-15.
  6. ^ "IEEE Donald O. Pederson Award in Solid-State Circuits Recipients". IEEE. Retrieved 2019-01-15.
  7. ^ "Paul Rappaport Award". IEEE. Retrieved 2019-01-15.
  8. ^ "IEEE Jun-ichi Nishizawa Medal Recipients". IEEE. Retrieved 2019-01-15.
  9. ^ Mark LaPedus (June 17, 2009). Hu receives IEEE award. EE Times. Archived July 9, 2016.
  10. ^ "Asian American Engineer, Award". Retrieved 2019-01-15.
  11. ^ "National Taiwan University Distinguished Alumni Award". Retrieved 2019-01-15.
  12. ^ "Semiconductor Industry Association Award" (PDF). Retrieved 2019-01-15.
  13. ^ "Phil Kaufman Award for Distinguished Contributions to EDA". IEEE. Retrieved 2019-01-15.
  14. ^ "Chenming Hu". Retrieved 2019-01-15.
  15. ^ "Remarks by the President at Ceremony Honoring the Recipients of the National Medal of Science, and the National Medal of Technology and Innovation". The White House - President Barack Obama. May 19, 2016. Retrieved 2019-01-15. National Medal of Technology and Innovation to Chenming Hu, University of California, Berkeley, California. For pioneering innovations in microelectronics including reliability technologies, the first industry-standard model for circuit design, and the first 3-dimensional transistors, which radically advanced semiconductor technology.
  16. ^ SEMI Award for North America: About the SEMI Award. Semiconductor Equipment and Materials International. Accessed July 2016.