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File:Rotating illumination across slit.png

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English: For the arc-shaped slit in an EUV lithography system, the same illumination is rotated across slit.[1][2][3][4][5][6][7] Consequently, it will be necessary to counter-rotate the illumination pupil source at different slit locations (at different times) to compensate, as indicated by the different colors above. Otherwise, light from allowed illumination angles will be rotated to become forbidden angles, and the pattern orientation must change across slit,[8] to avoid the forbidden illumination angles (see first figure below). In the latter case, a rectangular layout after rotation would occupy a substantially larger area,[8][9] with the area difference unable to be used or else forced to be filled.
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Forbidden pupil locations. Some forbidden illumination angles will be inadvertently exposed by pupil rotation through slit. This example represents the 41 nm vertical line pitch (k1=0.5 for 0.33 NA).
Increased area due to pattern rotation.

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  1. ↑ D. Hellweg et al., Proc. SPIE 7969, 79690H (2011).
  2. ↑ R. Capelli et al., Proc. SPIE 10957, 109570X (2019).
  3. ↑ R. Capelli et al., Proc. SPIE 9231, 923109 (2014).
  4. ↑ K. Hooker et al., Proc. SPIE 10446, 1044604 (2017).
  5. ↑ E. van Setten et al., Proc. SPIE 10450, 104500W (2017).
  6. ↑ A. Garetto et al., J. Micro/Nanolith. MEMS MOEMS 13, 043006 (2014).
  7. ↑ T-S. Eom et al., Proc. SPIE 8679, 86791J (2013).
  8. ↑ a b C-H. Chang et al., US Patent 9091930.
  9. ↑ Rotated rectangle

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current21:15, 20 August 2019Thumbnail for version as of 21:15, 20 August 20191,082 × 416 (27 KB)OgreBot(BOT): Reverting to most recent version before archival
21:15, 20 August 2019Thumbnail for version as of 21:15, 20 August 2019991 × 393 (21 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2019-06-17 15:38:54 by Guiding light
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