File:EUV pattern effect on SMO effectiveness.png

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Summary

Description A mere widening of a power rail feature (top and bottom of sampled pattern) is enough to drastically change the optimized pupil shape as well as degrade the range of best focus at different points in the 32 nm target pitch pattern, even with the use of assist features. Ref.: T. Last et al., Proc. SPIE 10143, 1014311 (2017).
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Author Guiding light
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The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2017-06-12 01:25:15 884 × 306 Guiding light Correct label colors
2017-06-06 13:10:34 1006 × 345 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

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6 June 2017

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current16:00, 2 April 2020Thumbnail for version as of 16:00, 2 April 2020884 × 306 (28 KB)Hippymoose17Transferred from en.wikipedia (MTC!) (1.1.0)
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