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Summary
| Description |
English: A metal layer targeting 16 nm CD patterned with EUV SMO single exposure is able to have a 100 nm CD 200 nm pitch overlay mark more in line with the 16 nm half-pitch metal lines, but not every feature in the same layer is easily captured within +/-1 nm shift over +/- 40 nm focus window. Ref.: W. Gillijns et al., Proc. SPIE vol. 10143, 1014314 (2017). |
| Date | |
| Source | Excel |
| Author | Guiding light |
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
Transferred from en.wikipedia to Commons using For the Common Good.
The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 11:38, 11 July 2017 | 514 × 267 (11,692 bytes) | w:en:Guiding light (talk | contribs) | |
| 03:27, 11 July 2017 | 514 × 267 (11,566 bytes) | w:en:Guiding light (talk | contribs) | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 03:52, 11 October 2018 | | 514 × 267 (11 KB) | OgreBot | (BOT): Reverting to most recent version before archival |
| 03:52, 11 October 2018 |  | 514 × 267 (11 KB) | OgreBot | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2017-07-11 03:27:39 by Guiding light | |
| 23:39, 9 October 2018 |  | 514 × 267 (11 KB) | Arlene the bean | Transferred from en.wikipedia: see original upload log above |
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