Hafnium(IV) silicate

Hafnium(IV) silicate
Preferred IUPAC name Hafnium(IV) silicate
Systematic name Hafnium(4+) silicate
Identifiers
PubChem	17979268
ChemSpider	16470992 Y
Jmol-3D images	Image 1
SMILES [Hf+4].[O-][Si]([O-])([O-])[O-]
InChI InChI=1S/Hf.O4Si/c;1-5(2,3)4/q+4;-4 Key: VCFZGYGRRNTEGX-UHFFFAOYSA-N
Properties
Molecular formula	HfO4Si
Molar mass	270.57 g mol−1
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO₄.

Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.