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Summary
| Description |
English: The point spread function of the High-NA EUV tool has a higher tendency to sidelobes stochastically occurring at a certain separation due to the central obscuration.[1] |
| Date | |
| Source | Own work |
| Author | Guiding light |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 01:46, 25 May 2022 | | 480 × 289 (16 KB) | Guiding light | Uploaded own work with UploadWizard |
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